A-Star Photonics について
A-Star Photonics は、中国／福州に本社を置く、光学部品、結晶材、高精度光学機器等に注力するメーカーです。
当社はA-Star Photonicsの代理店です。
ラインナップ
Crystal
BBO Crystal
用途
- レーザークリスタル
- NOPAクリスタル他
仕様
| Flank Size(W*H) | 1×1~25×25 |
|---|---|
| Length(L) | 0.005~25 mm |
| Phase Matching Angle(θ,φ) | Angel or according to customer request |
| Match Type | type I or type II |
| Angle Tolerance | Δθ<±0.2°; Δφ<±0.2° |
| Size Tolerance | (W ±0.1 mm) x (H ±0.1 mm) x (L +0.2 mm/-0.1 mm) |
| Flatness | <λ/8 @ 633 nm |
| Smooth Finish | 20/10 |
| Parallelism | <30″ |
| Perpendicularity | <10′ |
| Wavefront Distortion | <λ/8 @ 633 nm |
| Clear Aperture | > 90% |
| Coating | P-coating or according to customer request |
LBO Crystals
用途
- 超高速 Ti:sapphireレーザー
- 光学パラメータ式発振器
- 光パラメトリック増幅器他
特性
| Crystal Structure | Orthorhombic, mm2 |
|---|---|
| Cell Parameters | a = 8.4473, b = 7.3788Å, c = 5.1395Å, Z = 2 |
| Melting point | 834°C |
| Optical homogeneity | d n ~ 10-6/cm |
| Mohs hardness | 6 |
| Density | 2.47 g/cm3 |
| Absorption coefficient | < 0.1%/cm (at 1064 nm and 532 nm) |
| Specific heat | 1.91J/cm3xK |
| Hygroscopic susceptibility | low |
| Thermal expansion coefficients | a, 4 x 10-6/K; c, 36 x 10-6/K |
| Thermal conductivity | ^ c, 1.2 W /m /K ; //c, 1.6 W /m /K |
LiNbO3 & MgO:LiNbO3
用途
- ポッケルセル
- Qスイッチ
- 位相変調器
- 弾性表面波(SAW)ウエハー
特性
| Crystal Structure | Trigonal, space group R3c |
|---|---|
| Cell Parameters | a=0.515,c=13.863,Z=6 |
| Melting Point | 1255 +/-5℃ |
| Curie Point | 1140 +/-5℃ |
| Mohs Hardness | 5 |
| Density | 4.64 g/cm3 |
| Absorption Coefficient | ~ 0.1%/cm @ 1064 nm |
| Solubility | insoluble in H2O |
| Relative Dielectric Constant | εT11/ε0: 85 εT33/ε0:29.5 |
| Thermal Expansion Coefficients at 25℃ |
||a, 2.0 x 10 -6/K @ 25℃ ||c, 2.2 x 10 -6/K @ 25℃ |
| Thermal Conductivity | 38 W /m /K @ 25℃ |
DKDP&KDP
特徴
- 優れた UV透過
- 高い光学損傷閾値
- 優れた複屈折及び非線形係数
用途
- 高出力レーザー 周波数変換物質
- 高速写真撮影用シャッター
- 電気工学変調機及びQスイッチ他、
KD*P Single A-STAR— Standard
| Designation | Operation | Input | Output |
|---|---|---|---|
| 53.7° | SHG (II) | 1064 nm | 532 nm |
| 59.5° | THG (II) | 1064 nm + 532 nm | 355 nm |
| 86° | FHG (I) angle tune | 532 nm | 266 nm |
| 90° | FHG (I) temp. tune | 532 nm | 266 nm |
| Wavefront distortion | less than l/8 @ 633 nm |
|---|---|
| Dimension tolerance | (W± 0.1 mm) x (H±0.1 mm) x (L + 0.2 mm/-0.1 mm) |
| Clear aperture | > 90% central area |
| Flatness | l/8 @ 633 nm |
| Scratch/Dig code | 10/5 to MIL-O-13830A |
| Parallelism | better than 20 arc seconds |
| P erpendicularity | 5 arc minutes |
| Angle tolerance | Dq <± 0.3°, Df <±0.3° |
| Quality Warranty Period | one year under proper use |
KTP
特徴
- 大きな 非線形光学係数
- 幅広い温度及びスペクトラル帯域幅
- 高電気工学係数及び低い誘電率
- 非吸湿性、優れた化学及び機械的特性
用途
- Nd-ドープレーザー(緑・赤色出力)の周波数倍増
- Ndレーザー及びレーザーダイオード(青色出力)の周波数混合
- 0.6 mm-4.5 mm 可変出力の為のパラメトリック源(OPG, OPA and OPO)
- E-O 変調機、光学スイッチ、方向性結合器他、
| ATTRIBUTE | COMMERCIAL | HIGH PRECISION |
|---|---|---|
| Wavefront Distortion | λ/8 | λ/8 |
| Orientation | ±0.5° | ±0.2° |
| Dimension Tolerance | ±0.1 mm | ±0.01 mm |
| End-faces Configuration | Flat | |
| Surface Quality | 20-10 scratch and dig | 0-5 scratch and dig |
| Flatness | λ/8 | λ/10 |
| Parallelism | 20″ | 10″ |
| Intrinsic Loss | 50ppmcm-1@ 1064 nm | |
KTA Crystal
特徴
- 幅広い温度及びスペクトラル帯域幅
- 低誘電率、低損失係数、イオン伝導率
- 高い損傷閾値
用途
- 周波数倍増 (SHG @1083nm-3789nm)
- 和周波数及び差周波数(SFG)/(DFG)他
| KTA Crystal Specification | |
|---|---|
| Dimension Tolerance | ±0.1 mm |
| Flatness | <λ/8 @633 nm |
| Surface Quality | 10/5 Scratch/Dig |
| Parallelism | better than 30 arc sec. |
| Perpendicularity | better than 30 arc min |
| Angle Tolerance | △q < 0.5°,△f < 0.5° |
| AR Coating | AR coatings |
| Clear Aperture | >90% central area |
| Transmitting Wave front Distortion | less than l/8 @ 633 nm |
Nd:YAG
用途
- レーザー媒体（個体レーザー）
仕様
| Nd Dopant Concentration | 0.5-1.2 atm%tolerance within 10% of concentration |
|---|---|
| Diameter | 3 ~ 14 mm |
| Length(L) | 0.5~160 mm |
| Orientation | <111> crystalline direction (+/-0.5℃) |
| Flatness | <λ/8 @ 633 nm |
| Smooth Finish | 20/10 |
| Parallelism | <30″ |
| Perpendicularity | <10′ |
| Wavefront Distortion | < λ/8 @ 633 nm |
| Clear Aperture | > 90% |
| Coating | According to customer request |
Optical Components
平凸レンズ（plano-convex lenses）
仕様
| Material | BK7, Fused Silica, SF10, CaF2, Sapphire .etc. |
|---|---|
| Paraxial Focal Length Tolerance | ±2% |
| Dimension Tolerance | ±0.2(General). ±0.05(High Precision) |
| Centration | <3 arc min |
| IRR | λ/4@633 nm（General),λ/10@633 nm(High Precision) |
| Clear Aperture | >80%(Small Size), >95%(Large Size) |
| Surface Figure | <1.5λ@633 nm（General),<λ/4@633 nm(High Precision) |
| Surface Quality | 60/40（General),10/5(High Precision) |
| Bevel | <0.25 mm |
| Coating | Uncoated, AR,PR, HR, etc. |
平凹レンズ（plano-concave lenses）
用途
- 焦点距離増大（既存システム）
仕様
| Material | BK7, Fused Silica, SF10, CaF2, Sapphire .etc. |
|---|---|
| Paraxial Focal Length Tolerance | ±2% |
| Dimension Tolerance | ±0.2(General). ±0.05(High Precision) |
| Centration | <3 arc min |
| IRR | λ/4@633 nm（General),λ/10@633 nm(High Precision) |
| Clear Aperture | >80%(Small Size), >95%(Large Size) |
| Surface Figure | <1.5λ@633 nm（General),<λ/4@633 nm(High Precision) |
| Surface Quality | 60/40（General),10/5(High Precision) |
| Bevel | <0.25 mm |
| Coating | Uncoated, AR,PR, HR, etc. |
Achromatic Double Lens
用途
- 有色及び球面収差効果の制限
仕様
| Material | BK7 glass and ZF2 or ZF4 |
|---|---|
| EFL | +/- 2% |
| Diameter | +0, -0.18 |
| Center thickness tolerance | +/- 0.20 |
| Surface quality | 40/20 scratch/dig |
| Centeration | 2 arc minimum |
Cylindrical Lens
用途
- バーコードスキャニング
- レーザー計測システム
- ホログラフィ
| Material | BK7(H-K9L), fused silica(JGS1),SF10(H-ZF13) |
|---|---|
| Surface Figure | λ /2@633 nm on plano side |
| Surface Quality | 60/40 Scratch/Dig |
| Dimension Tolerance | + 0.0 mm, – 0.1 mm |
| Thickness Tolerance | ± 0.2mm |
| Chamfer | 0.25 mm at 45° typical |
| Concentricity | 3 minutes |
| Focal Length Tolerance | ± 1% typical |
| Antireflection Coating | Wavelength user specified |
| R 0.25% for V-type AR coating | |
| R 0.5% for BBAR coating, per surface. | |
| Clear Aperture | Exceeds central 85% of dimension |
偏光光学（Polarization Optics）
ローオーダー波長板（Low Order Waveplate）
シングルプレートローオーダー波長板
仕様
| Material | Quartz |
|---|---|
| Dimension Tolerance | +0.0/-0.1 mm |
| Surface Quality | 20/10 |
| Flatness | λ/8@633 nm |
| Parallelism | <1 arc Second |
| Retardation Tolerance | λ/300 |
| Clear Aperture | >90% |
| AR Coated | R <0.2%@Wavelength |
| Standard WaveLength | 266 nm,355 nm,532 nm,63.28 nm,780 nm,808 nm, 850 nm,980 nm,1064 nm,1310 nm,1480 nm,1550 nm |
ゼロオーダー波長板（Zero Order Waveplate）
仕様
| Attribute | Specification |
|---|---|
| Material | Quartz |
| Dimension Tolerance | +0.0/-0.1 mm |
| Surface Quality | 20/10 Scratch/Dig |
| Flatness | λ/8@633 nm |
| Parallelism | <1 arc Second |
| Retardation Tolerance | λ/500 |
| Clear Aperture | >90% |
| AR Coated | R <0.2%@Wavelength |
| Standard Wavelength | 266 nm,355 nm,532 nm,63.28 nm,780 nm,808 nm, 850 nm,980 nm,1064 nm,1310 nm,1480 nm,1550 nm |
デュアルウェイブレングス波長板(Dual wavelength Waveplate)
Dual Wavelength Waveplate
仕様
| Material | Quartz |
|---|---|
| Dimension Tolerance | +0.0/-0.1 mm |
| Surface Quality | 20/10 |
| Flatness | λ/8@633 nm |
| Parallelism | <1 arc Second |
| Retardation Tolerance | λ/300 |
| Clear Aperture | >90% |
| AR Coated | R <0.2%@Wavelength |
| Standard WaveLength | 800 nm&400 nm,1064 nm&532 nm |
Lens Assembly
レンズアッセンブリ(Lens Assembly)
カスタム化にも対応し、顧客ニーズに応じ、設計及び製造が可能です。
| lens assemblies Types | Optical Assemblies, lens assembly |
|---|---|
| Lens Assembly |  |
| Precision Optics Assembly (Supply mounting for various Crystals, Beamsppliers, ,Polarizers, Waveplates etc.) |
 |
| Other Lenses Assembly (OEM ) |
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